Inhibition of deposition and removal of carbon films on the multilayer surface by EUV irradiation in the presence of water vapor, oxygen and ozone gases - (PPT)

摘要

Once deposited C films can be removed by EUV irradiation in the presence of water vapor, oxygen gas or oxygen+ozone gas atmosphere. The removal rate of C film by oxidized gases introduction and EUV irradiation was large in the order of ozone > oxygen > and water vapor. Mitigation effect of C film deposition was also observed for n-decane gas atmosphere by simultaneously introducing water vapor, oxygen or oxygen+ozone gases. The mitigation effect was fairly high in the case of introducing oxygen+ozone gas.