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Investigation of InGaP/InGaAs pseudomorphic triple doped-channel field-effect transistors

机译:Ingap / Ingaas Pseudomorphic三重掺杂通道场效应晶体管的研究

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The comparison of DC performance on InGaP/InGaAs pseudomorphic field-effect transistors with triple doped-channel profiles is demonstrated. As compared to the uniform and high-medium-low doped-channel devices, the low-medium-high doped-channel device exhibits the broadest gate voltage swing and the best device linearity. Experimentally, the transconductance within 50% of its maximum value for gate voltage swing is 4.62 V in the low-medium-high doped-channel device, which is greater than 3.58 (3.30) V in the uniform (high-medium-low) doped-channel device.
机译:证明了具有三重掺杂通道轮廓的InGaP / IngaAs假晶场效应晶体管的DC性能的比较。与均匀和高中低掺杂通道装置相比,低介质高掺杂通道装置具有最广泛的栅极电压摆动和最佳的装置线性。在实验上,在栅极电压摆动的最大值的50%以内的跨导在低中型高掺杂通道装置中为4.62V,掺杂均匀(高中低温)的3.58(3.30)V大于3.58(3.30)V. -Channel设备。

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