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Full-3D real-space treatment of surface roughness in double gate MOSFETs

机译:双闸MOSFET中表面粗糙度的全3D实时处理

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We analyze the effects of surface roughness on double gate (DG) MOSFETs by means of a full-3D real-space self-consistent Poisson-Schrodinger algorithm within the non equilibrium Green's function (NEGF) formalism. We include periodic (Cauchy) boundary conditions along one of the transverse directions, whereas Dirichlet conditions are imposed along the vertical one. Surface roughness (SR) is included via a random generation of spatial fluctuations obeying an exponential autocorrelation law, and transfer characteristics are computed for different values of the root mean square (RMS) of such fluctuations. Simulation results show an impact of SR on the drain current and a shift of the threshold voltage proportional to the RMS. Quasi-ballistic transport is analyzed by means of backscattering coefficient. This is found to be limited by subband fluctuations at low inversion charge density and by mode-mixing at large one.
机译:我们通过非平衡绿色功能(Negf)形式主义内的全3D实场自我一致泊松 - Schrodinger算法分析了表面粗糙度对双栅极(DG)MOSFET的影响。我们包括沿着横向方向之一的周期性(Cauchy)边界条件,而Dirichlet条件沿垂直施加。表面粗糙度(SR)通过遵守指数自相关法律的随机产生的空间波动包括,并且计算出这种波动的根均线(RMS)的不同值的传递特性。仿真结果显示SR对漏极电流的影响和与RMS成比例的阈值电压的偏移。通过反向散射系数分析准弹道传输。发现这是由低反转电荷密度的子带波动的限制,并且通过大的模态混合。

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