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Efficient automatic computation of veiling glare from scatter and ghosts by a simple modification to Monte-Carlo ray tracing

机译:通过简单的修改对Monte-Carlo射线跟踪的简单修改,高效自动计算散射和幽灵的眩光

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Veiling glare is a somewhat obsolete term referring to stray light from an in-field extended source bleeding into adjacent dark regions of the image. In most systems ghost reflections and scatter from the contaminated or imperfectly polished optical surfaces are the main culprits. Standard stochastic or deterministic methods for calculating scattered light from out-of-field sources are cumbersome in this domain. On the other hand, basic Monte Carlo ray tracing is straightforward. Its implementation in the GelOE optical engineering software is based on a fast hybrid physical-optics/geometrical-optics technique for surface scatter. However, a prohibitive number of rays are still required to get accurate results. Instead of the standard ray-splitting and importance-area modifications to make it more efficient, a much simpler one is proposed and then applied to a representative lens system, resulting in a 100 to 1000 fold reduction in the number of rays required for the same accuracy.
机译:遮蔽眩光是一种稍微过时的术语,从现场延伸源出血中的杂散光进入图像的相邻暗区。 在大多数系统中,鬼魂反射和污染的或不完美的光学表面的散射是主要的罪魁祸首。 用于计算来自现场外源的散射光的标准随机或确定方法在该结构域中是麻烦的。 另一方面,基本的蒙特卡罗射线跟踪是简单的。 其在Geloe光学工程软件中的实现基于用于表面散射的快速混合物理光学/几何光学技术。 但是,仍然需要禁止的射线数量来获得准确的结果。 代替标准的射线分裂和重要区域修改,以使其更有效,提出更简单,然后应用于代表透镜系统,导致相同所需的光线数量为100至1000倍 准确性。

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