Algorithm for determining printability and colouringof a target layout for double patterning

摘要

An algorithm is presented which performs a model-based colouring of a given layout for double patterning. The algorithm searches the space of patterns which can be printed with a particular wavelength and numerical aperture, and seeks to find a pair of patterns which combine to produce the desired target layout. This is achieved via a cost function which encodes the geometry of the layout and allowable edge placement tolerances. If the layout is not printable by double patterning, then the algorithm provides a closest solution and indicates hotspots where the target is not feasible.