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Atomic Structure of Hydrous Ruthenium Oxide Coating on Ti and CNT Substrate by Cathodic Deposition Method

机译:通过阴极沉积法对Ti和CNT底物上含水钌氧化物涂层的原子结构

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In this study, hydrous ruthenium oxide was deposited on titanium(Ti) and carbon nanotube(CNT) substrate by cathodic deposition method. Combination of amorphous and nanocrystalline structure of hydrous ruthenium oxide was investigated by high resolution electron microscopy. The measured capacitance was found keeping nearly constant through charge/discharge processes for hydrous ruthenium oxide coating on Ti substrate. On the other hand, thin and uniform layer of hydrous ruthenium oxide coating can be deposited on CNT substrate. The thickness of the coating layer was found less than 10 nm. Combination of amorphous and nanocrystalline structure of hydrous ruthenium oxide was also investigated on this specimen. The consumption of coating was found very effective for this specimen after 10~5 charge/discharge cycles which lead to the tremedenously decreasing in the measured capacitance.
机译:在该研究中,通过阴极沉积方法在钛(Ti)和碳纳米管(CNT)底物上沉积含水钌氧化物。通过高分辨率电子显微镜研究了含水钌氧化物的无定形和纳米晶体结构的组合。发现测量的电容通过Ti衬底上的含水钌涂层的电荷/放电方法保持几乎恒定。另一方面,可以在CNT底物上沉积薄且均匀的含水氧化钌涂层。发现涂层的厚度小于10nm。在该样品上还研究了含水钌氧化钌的无定形和纳米晶体结构的组合。在10〜5充电/放电循环之后,发现涂层的消耗非常有效,这导致测量电容中的瞬间减小。

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