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Atomic Structure of Hydrous Ruthenium Oxide Coating on Ti and CNT Substrate by Cathodic Deposition Method

机译:阴极沉积法在Ti和CNT基体上水合氧化钌涂层的原子结构

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In this study, hydrous ruthenium oxide was deposited on titanium(Ti) and carbon nanotube(CNT) substrate by cathodic deposition method. Combination of amorphous and nanocrystalline structure of hydrous ruthenium oxide was investigated by high resolution electron microscopy. The measured capacitance was found keeping nearly constant through charge/discharge processes for hydrous ruthenium oxide coating on Ti substrate. On the other hand, thin and uniform layer of hydrous ruthenium oxide coating can be deposited on CNT substrate. The thickness of the coating layer was found less than 10nm. Combination of amorphous and nanocrystalline structure of hydrous ruthenium oxide was also investigated on this specimen. The consumption of coating was found very effective for this specimen after 105 charge/discharge cycles which lead to the tremedenously decreasing in the measured capacitance.
机译:本研究采用阴极沉积法将含水氧化钌沉积在钛(Ti)和碳纳米管(CNT)基底上。通过高分辨率电子显微镜研究了含水氧化钌的无定形和纳米晶体结构的组合。发现通过充电/放电过程,Ti衬底上的含水氧化钌涂层可测得的电容几乎保持恒定。另一方面,含水钌氧化物涂层的薄且均匀的层可以沉积在CNT基底上。发现涂层的厚度小于10nm。还研究了该水合氧化钌的无定形和纳米晶体结构的组合。在经过105次充/放电循环后,发现该样品的涂层消耗非常有效,这导致测量电容急剧减小。

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