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首页> 外文期刊>Surface & Coatings Technology >Localised oxidation defects in TiAlN/CrN superlattice structured hard coatings grown by cathodic arc/unbalanced magnetron deposition on various substrate materials
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Localised oxidation defects in TiAlN/CrN superlattice structured hard coatings grown by cathodic arc/unbalanced magnetron deposition on various substrate materials

机译:TiAlN / CrN超晶格结构硬涂层中的局部氧化缺陷,该缺陷是通过在各种基底材料上进行阴极电弧/不平衡磁控管沉积而形成的

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摘要

TiAlN/CrN superlattice coatings show excellent surface oxidation resistance up to 900℃, with an as deposited hardness maximum of HK 3400 (bi4ayer 3.8 nm). Coated M2 high speed steel and cemented carbide samples have been examined by scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDX) after heat treatment in air between 600℃ and 1000℃ to study the influence of the oxidation behaviour. X-ray diffraction (XRD) and thermogravimetric (TG) measurements were performed on the uncoated substrates to gain an overall picture of the oxidation stability of the plain substrate materials at high temperatures. Globular oxides were observed on coated cemented carbide at 700℃, while on M2 high speed steel similar oxides did not form below 800℃. The 'small globular oxides were gradually replaced by spherical oxides mainly formed out of substrate material. Initially oxidation starts at the bottom of pores or craters produced by small droplets or by growth defects grown on the droplets. The droplets were deposited during the cathodic arc metal ion step whereas the growth defects developed during film growth. Some detached growth defects formed craters through which oxidation products formed from the substrate material. Elements from the substrate penetrated to the coating surface at temperatures far below the actual oxidation temperature of TiAlN/CrN (900℃), namely at temperatures as low as 700℃ (on cemented carbide). On M2 and stainless steel SS304, this type of localised oxidation was observed at temperatures equal to and above 900℃.
机译:TiAlN / CrN超晶格涂层在高达900℃的温度下仍具有出色的表面抗氧化性,沉积的硬度最大值为HK 3400(bi4ayer 3.8 nm)。在600℃至1000℃的空气中进行热处理后,通过扫描电子显微镜(SEM)和能量色散X射线分析(EDX)对涂层的M2高速钢和硬质合金样品进行了研究,以研究氧化行为的影响。在未涂覆的基材上进行X射线衍射(XRD)和热重(TG)测量,以得到在高温下普通基材的氧化稳定性的总体图。 700℃时,在涂层硬质合金中观察到球状氧化物,而在M2高速钢中,在800℃以下则未形成类似氧化物。小的球形氧化物逐渐被主要由基底材料形成的球形氧化物所代替。最初,氧化开始于由小液滴或在液滴上生长的生长缺陷产生的孔或火山口的底部。液滴在阴极电弧金属离子步骤中沉积,而在膜生长过程中出现了生长缺陷。一些脱离的生长缺陷形成了凹坑,通过该凹坑由基板材料形成了氧化产物。在远低于TiAlN / CrN的实际氧化温度(900℃)的温度下,即在低至700℃的温度下(在硬质合金上),来自基材的元素渗透到涂层表面。在M2和不锈钢SS304上,在900℃以上的温度下观察到了这种局部氧化。

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