Study on the Properties of Ionized Metal PlasmaMethodology on Titanium

摘要

Ionized Metal Plasma (IMP) deposition was used in depositing metal interconnection of titanium metal film. Inductively coupled plasma (ICP) was attached to chamber wall where it creates an electromagnetic field, thus, ionizing the sputtered metal atoms from target. The film morphology was observed by scanning electron microscope (SEM). Acoustic measurement of titanium film thickness showed that there was a comparable result with film resistance measured by 4-point probe. Results show that higher plasma density would cause tensile properties on the film stress.