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The Effect of Annealing Process on theColloidal Golds and Gallium ArsenideNanowires

机译:退火过程对胶体金和砷化镓纳米线的影响

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Nanowires as a one dimensional building block have generated a lot of interests due to their unique physical properties and potential to revolutionize broad areas of nanotechnology. For successful applications, precise knowledge about the effect of the various growth parameters is essential. In this study, we report the effects of annealing process on colloidal gold and GaAs nanowires using metal-organic chemical vapor deposition. AFM observation showed that the annealing process of colloidal gold, the substrate surface was attacked with a pit left behind where Au and Ga dissolved to form eutectic alloy. The morphological studies using FE-SEM of the as-annealed GaAs nanowire showed the direction of the GaAs nanowire to be 35° inclined from the <100> surface but grown almost perpendicular to the substrate when the annealing process was omitted from the MOCVD growth process flow. TEM studies showed that the GaAs nanowires grown on <100> orientation substrate without annealing process have less crystal lattice defects compared to the one grown with annealing process.
机译:由于其独特的物理性质和彻底彻底改变纳米技术的潜力,纳米线产生了很多兴趣。对于成功的应用,关于各种生长参数效果的精确知识至关重要。在这项研究中,我们通过金属 - 有机化学气相沉积报告了退火过程对胶体金和GaAs纳米线的影响。 AFM观察表明,胶体金的退火过程,底物表面被留下的坑攻击,其中Au和Ga溶解形成共晶合金。使用消耗的GaAs纳米线Fe-Sem的形态学研究表明,当从MOCVD生长过程中省略退火过程时,GaAs纳米线的方向为35°,但在退火过程中省略退火过程时几乎垂直于基板。流动。 TEM研究表明,与用退火工艺生长的人相比,没有退出工艺的GaAs纳米线在没有退出过程的情况下具有较少的晶格缺陷。

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