首页> 外文会议>International Symposium on Photoelectronic Detection and Imaging >A Review of Developments in the Preparation Methods of Tantalum Pentoxide Film
【24h】

A Review of Developments in the Preparation Methods of Tantalum Pentoxide Film

机译:钽五氧化二钽膜制备方法的述评

获取原文

摘要

Tantalum pentoxide film has a huge application potential in microelectronic field owing to its good chemical stability and thermal stability, and its good compatibility with semiconductor integrated circuit. In addition, Tantalum pentoxide film also has a high dielectric constant, a high refractive index, low absorption rate and a wide spectral range from 300nm to 1000nm in the visible spectral region. At present, it has a wide application in antireflection coatings, lasers, optical communication, solar wafers and so on. This review will focus on the preparation methods of Tantalum pentoxide film, and tantalum pentoxide film's property and application, which are better for us to choose an appropriate method in an appropriate occasion.
机译:由于其良好的化学稳定性和热稳定性,钽五烯薄膜在微电子场具有巨大的应用势,以及其与半导体集成电路的良好兼容性。此外,钽五氧化钽膜还具有高介电常数,高折射率,低吸收率和可见光谱区域中300nm至100nm的宽光谱范围。目前,它在抗反射涂层,激光器,光通信,太阳晶片等方面具有广泛的应用。本综述将专注于钽五氧化钽膜的制备方法,钽五氧化钽膜的性质和应用,这对我们最好在适当的场合选择合适的方法。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号