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Characterization of Mano Scale PMMA Films Prepared by FDC Technique for FET Applications

机译:FET应用FDC技术制备的Mano ScalmMMA膜的特征

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Poly methyl methacrylate (PMMA) thin films were prepared by fast dip coating technique (FDCT). Benzene was used as a solvent to prepare PMMA films for various time periods ranging from 60 sec. to 1 hour. The thickness of the coated films were measured by using an electronic thickness measuring instrument (Tesatronic-TTD-20), gravimetric method and cross checked by optical spectrophotometer. FTIR spectrum was used to identify the above said coated films. XRD spectra of as grown and films annealed at various temperatures indicated the amorphous nature. Surface morphology of the coated films was studied by scanning electron microscope (SEM). No pits and pin holes were found in the surface. Both as grown and annealed films showed smooth and amorphous structure. C-V behavior of the MISM structures with Aluminum/PMMA/p-Si/Aluminum has been studied. C-V behavior for various bias voltage range of - 20 V to +20 V was provided. As grown films showed a flat band voltage (Vfb) shift towards the positive voltage where as annealed films showed a decrease in V_(FB )shift and it moved towards the zero flat band voltage (Vfb ~ 0) value. The observed surface morphology, C-V behavior and thermal stability indicated that these films could be used as effective dielectric layer in FET applications.
机译:通过快速浸涂技术(FDCT)制备聚甲基丙烯酸甲酯(PMMA)薄膜。苯被用作溶剂,以制备PMMA薄膜,各种时间段为60秒。到1小时。通过使用电子厚度测量仪(Tesatronic-TTD-20),重量测定方法和通过光学分子检查来测量涂膜的厚度。使用FTIR光谱鉴定上述所述涂层膜。作为在各种温度退火的生长和薄膜的XRD光谱表明了无定形性质。通过扫描电子显微镜(SEM)研究涂膜的表面形态。表面上没有发现凹坑和尖头孔。随着种植和退火的薄膜均显示出光滑和无定形的结构。研究了Mism结构的C-V行为用铝/ PMMA / P-Si /铝。提供了各种偏置电压范围的C-V行为-20V至+20V。由于生长的薄膜显示出扁平带电压(VFB)朝向正电压转移,其中作为退火薄膜显示V_(FB)偏移的减小,并且它朝向零扁平带电压(VFB〜0)值移动。观察到的表面形态,C-V行为和热稳定性表明,这些薄膜可以用作FET应用中的有效介电层。

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