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Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

机译:6.x nm波长的LAN / B多层镜的优化

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In this article we present an overview of the optimization of LaN/B multilayers that enabled the deposition of a multilayer with a normal incidence reflectance of 57.3 % at 6.6 nm wavelength, the highest value reported to date. Two different ways of nitridation of the La layers were investigated: firstly N-ion post treatment of the La layer and secondly reactive magnetron sputtering of La in N2 atmosphere. Initially the optimization of the multilayers was performed for 50 period test multilayers, followed by the selection of the best process to study the stability of the full stack deposition and the optical performance of the mirrors. The scaling of reflectivity with increasing number of periods for LaN/B multilayer mirrors will also be discussed.
机译:在本文中,我们概述了LAN / B多层优化的概述,使得能够在6.6nm波长下的正常入射反射率为57.3%的正常入射反射率的沉积。研究了LA层的两种不同方式:首先是N-离子在N 2气氛中的LA层和第二反应性磁控溅射。最初,对多层的优化进行了50个时段测试多层,然后选择了研究完整堆叠沉积的稳定性和镜子的光学性能的最佳过程。还将讨论随着LAN / B多层镜子的越来越多的时间段的反射率的缩放。

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