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Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

机译:LaN / B多层反射镜针对6.x nm波长的优化

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In this article we present an overview of the optimization of LaN/B multilayers that enabled the deposition of a multilayer with a normal incidence reflectance of 57.3 % at 6.6 nm wavelength, the highest value reported to date. Two different ways of nitridation of the La layers were investigated: firstly N-ion post treatment of the La layer and secondly reactive magnetron sputtering of La in N_2 atmosphere. Initially the optimization of the multilayers was performed for 50 period test multilayers, followed by the selection of the best process to study the stability of the full stack deposition and the optical performance of the mirrors. The scaling of reflectivity with increasing number of periods for LaN/B multilayer mirrors will also be discussed.
机译:在本文中,我们概述了LaN / B多层膜的优化,该多层膜可以沉积6.6 nm波长下法向入射反射率为57.3%的多层膜,这是迄今为止报道的最高值。研究了两种不同的La层氮化方法:首先对La层进行N离子后处理,其次在N_2气氛中进行La的反应磁控溅射。最初,针对50个周期的测试多层进行了多层的优化,然后选择最佳工艺来研究全堆叠沉积的稳定性和反射镜的光学性能。对于LaN / B多层反射镜,随着周期数的增加,反射率的缩放也将得到讨论。

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  • 来源
    《Advances in X-ray/EUV optics and components VIII》|2013年|88480O.1-88480O.5|共5页
  • 会议地点 San Diego CA(US)
  • 作者单位

    FOM Institute DIFFER, Nieuwegein, the Netherlands;

    FOM Institute DIFFER, Nieuwegein, the Netherlands;

    FOM Institute DIFFER, Nieuwegein, the Netherlands;

    FOM Institute DIFFER, Nieuwegein, the Netherlands,MESA+ Institute for Nanotechnology, University of Twente, Enschede, the Netherlands;

    FOM Institute DIFFER, Nieuwegein, the Netherlands,MESA+ Institute for Nanotechnology, University of Twente, Enschede, the Netherlands;

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  • 正文语种 eng
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