MEASUREMENT OF EXTREME ULTRAVIOLET (EUV) INTENSITY OF COAXIAL FOCUSED PLASMA IN ACCORDANCE WITH THE PRESSURE OF ARGON AND NE-XE(30) FOR EUV LIGHT SOURCE

摘要

The Ar and Ne-Xe(30%) plasmas in dense plasma-focus device with coaxial electrodes were generated for extreme ultraviolet (EUV) lithography EUV intensity and electron temperature were investigated. An input voltage of 4.5kV was applied to the capacitor bank of 1.53 μF and the diode chamber was filled with Ar and Ne-Xe (30%) gas at a prescribed pressure. The inner surface of the cylindrical cathode has been lined by an acetal insulator. The anode was made of tin metal. The EUV emission signal with its wavelength is in the range of about 6～16 nm has been detected by a photo-detector (AXUV-100 Zr/C, IRD). The visible emission line has been also detected by the composite-grating spectrometer with its working wavelength of 200 ～ 1100nm (HR 4000CG). The electron temperature could be obtained by the optical emission spectroscopy (OES) and measured by the Boltzmann plot under the assumption of local thermodynamic equilibrium (LTE).