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Enhancement of the Strength and Stability of Ultraviolet-Irradiated Acellular Dermal Matrix by Adding Glucose

机译:添加葡萄糖通过添加紫外线辐照的无细胞皮肤基质的强度和稳定性

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In theory, Ultraviolet (UV)-generated free radicals can expedite Aceilular dermal matrix (ADM) crosslinking with glucose via the formation of reactive, linear glucose molecules. The aim of this study is to maintain strength and stability of UV-irradiated ADM without the introduction of cytotoxic chemical crosslinkers. The strength and stability changes of ADM by UV-irradiated with glucose (GLUC) were investigated under various conditions. ADM strength and stability were determined by tensile testing, differential scanning calorimetry (DSC), and swelling ratio. After exposure to UV-irradiation, ADM containing glucose revealed different mechanical properties compare to ADM without glucose, greater resistance to enzymatic degradation, and higher heat-denatured breaking loads. DSC explained that glucose-incorporated ADM sterilized by UV-irradiation decreased peak width (Tpeak-Ts) compared to one another. On the other hand, Area (J/g) and Ts increased glucose-incorporated ADM. The exposure of ADM to UV caused significant increase in hydration, but a significant decrease in the swelling ratio compared with the non-irradiated ADM. These data strongly suggests that free radical-dependent, glucose-derived crosslinks provide enhanced strength and enzyme resistance in glucose-incorporated, UV-exposed ADM.
机译:理论上,紫外线(UV)预先形成的自由基可以通过形成反应性的直链葡萄糖分子加快与葡萄糖的Aceilulare皮肤基质(ADM)交联。本研究的目的是保持UV辐照的ADM的强度和稳定性,而不会引入细胞毒性化学交联剂。在各种条件下研究了UV照射葡萄糖(Gluc)的ADM的强度和稳定性变化。通过拉伸试验,差示扫描量热法(DSC)和溶胀比确定ADM强度和稳定性。在暴露于紫外线照射后,含有葡萄糖的ADM显示出与ADM的不同机械性能,无葡萄糖,更耐酶促降解和更高的热变性破碎载荷。 DSC解释说,通过UV照射的葡萄糖掺入的ADM灭菌彼此相比降低了峰宽度(TPEAK-TS)。另一方面,面积(J / G)和TS增加葡萄糖掺入的ADM。 ADM至UV的暴露导致水合的显着增加,但与非照射ADM相比,溶胀比率显着降低。这些数据强烈表明,依赖自由基依赖性葡萄糖衍生的交联,提供增强的强度和酶抗性,在葡萄糖掺入,UV暴露的ADM中。

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