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Surface treatment of plastic substrates for improved adhesion of thin metal films through ion bombardment by an anode layer ion source

机译:阳极层离子源改善薄金属膜粘附性的塑料基材的表面处理

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Ion bombardment is an effective mechanism for the modification of polymer surfaces, removing contamination from polymer surfaces, increasing cross-linking of polymer chains and adding functional groups to increase bonding between the polymer substrate and deposited films. Anode layer ion sources (ALSs) provide high current ion beams with high reliability (no filaments or grids) and are easily scaled to treat wide substrates, making them ideal for ion beam pretreatment of polymer substrates. An improved ALS, the pointed pole anode layer ion source (PPALS) has been developed to produce a better collimated ion beam with a reduced rate of magnetic pole erosion due to sputtering by stray ions (pole sputtering). This results in reduced contamination of substrates and a longer lifetime of the magnetic poles. The PPALS was used to modify the surface of PMMA substrates by oxygen ion bombardment to increase the adhesion of a sputtered aluminum coating. To demonstrate the benefits of the PPALS design compared to conventional ALS sources, pole sputter contamination rates were measured, with the PPALS demonstrating significantly reduced contamination.
机译:离子轰击是对聚合物表面改性的有效机制,从聚合物表面去除污染,增加聚合物链的交联并加入官能团以增加聚合物基材和沉积膜之间的粘合。阳极层离子源(ALSS)提供具有高可靠性(无细丝或网格)的高电流离子束,并且容易缩放以处理宽基板,使得它们非常适用于聚合物基材的离子束预处理。已经开发出改进的ALS,尖锐的极阳极层离子源(PPALS)以产生更好的准直离子束,其由于溅射离子(极溅射)而导致的磁极腐蚀速率降低。这导致磁极的污染和磁极的较长寿命减少。 PPALS用于通过氧离子轰击改变PMMA基板的表面,以增加溅射铝涂层的粘附性。为了展示PPALS设计的益处与传统的ALS源相比,测量极溅射污染速率,PPALA显着降低污染。

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