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On-Chip Integration of InGaAs/GaAs Quantum Dot Lasers with Waveguides and Modulators on Silicon

机译:InGaAs / GaAs量子点激光器与波导和硅的调制器的片上整合

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Compound-semiconductor-based photonic devices, including lasers and modulators, directly grown and on-chip integrated on Si substrates provide a promising approach for the realization of optical interconnects with CMOS compatibility. Utilizing quantum dots as efficient dislocation filters near the GaAs-Si interface, for the first time, we demonstrated high-performance InGaAs/GaAs quantum dot (QD) lasers on silicon with a relatively low threshold current density (J_(th) = 900 A/cm~2), large small-signal modulation bandwidth of 5.5 GHz, and a high characteristic temperature (T_0 = 278 K). The integrated InGaAs QD lasers with quantum well (QW) electroabsorption modulators, achieved through molecular beam epitaxy (MBE) growth and regrowth, exhibit a coupling coefficient greater than 20% and a modulation depth ~100% at 5 V reverse bias. We achieved the monolithic integration of amorphous and crystalline silicon waveguides with quantum dot lasers by using plasma-enhanced-chemical-vapor deposition (PECVD) and membrane transfer, respectively. Finally, preliminary results on the integration of QD lasers with Si CMOS transistors are presented.
机译:基于复合半导体的光子器件,包括激光和调节剂,直接生长和在Si基板上集成的片上,提供了实现与CMOS兼容性的光学互连的有希望的方法。在GaAs-Si接口附近的高效位错过滤器中,首次利用量子点作为高效位错滤波器,在硅上展示了具有相对低的阈值电流密度的高性能IngaAs / GaAs量子点(QD)激光(J_(TH)= 900a / cm〜2),大小信号调制带宽为5.5 GHz,特征温度高(T_0 = 278 k)。具有量子阱(QW)电吸收器的集成IngaAs QD激光器通过分子束外延(MBE)生长和再生实现,表现出大于20%的耦合系数和5V反向偏压的调制深度〜100%。通过使用等离子体增强化学 - 化学 - 气相沉积(PECVD)和膜转印,我们通过量子点激光进行了与量子点激光的整体和晶体硅波导的单片集成。最后,提出了初步结果与SI CMOS晶体管的QD激光器集成的初步结果。

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