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Coaxial recess integration of InGaAs/InP edge emitting laser diodes with waveguides on silicon substrates : a complete solution to laser integration on ICs

机译:InGaas / Inp边缘发射激光二极管与硅基板上的波导同轴凹陷集成:IC上激光集成的完整解决方案

摘要

In this thesis, the first demonstration of the full integration of 1.55[mu]m InGaAs/InP edge emitting platelet laser diodes with SiON/SiO2 dielectric waveguides on a silicon substrate is presented. Small footprint laser platelets (300[mu]m long by 150[mu mwide and 6.3[mu]m high), are integrated and bonded in recesses etched in SiO2 deposited on a Si substrate, and are coaxially coupled to the dielectric waveguides fabricated on the same wafer. Lasers assembled in 6.5[mu]m deep recesses are securely solder-bonded in place with a thin film Al/In bonding layer, which also brings the laser platelet back side n-contact to the wafer front side for measurements. The Al/In bonding layer composition and thickness are carefully optimized to provide highly reproducible vertical alignment to maximize the coupling of the laser output beam to the dielectric waveguide. Lasers are bonded into the recesses with this solder-bonding layer during a pressure assisted temperature cycle at 220°C. The low temperature nature of the bonding phase makes this integration technique CMOS compatible. The integrated lasers show lasing operation with threshold currents of Ith=17mA and Ith=19mA for pulsed and continuous wave drives respectively, at T=15°C. The output spectrum shows single mode lasing near 1550[mu]m, and a side mode suppression ratio of 25dB which is significantly higher than typical Fabry Perot cavity laser diodes. Furthermore, the integrated lasers have a characteristic temperature, T0, of 76K which is improved from 60K for non-integrated lasers. Also the integrated lasers consistently show lower threshold currents compared to their non-integrated counterparts. The coupling loss between the laser and dielectric waveguide is extracted to be as low as 1dB, a value that can be further reduced by improved horizontal alignment and better matching the widths of laser stripe and dielectric waveguide. Overall, this recess integration approach is CMOS compatible, is highly modular, compact and flexible, permits testing and selection of devices prior to integration, and allows integration of lasers emitting at different wavelengths on the same chip. It eliminates the need for wafer bonding III/V substrates to the host Si IC along with added complexity and cost it involves, and can be implemented using easily accessible technologies.
机译:在本文中,提出了在硅衬底上完全集成1.55μm的InGaAs / InP边缘发射片状激光二极管和SiON / SiO2介电波导的第一个证明。小尺寸的激光薄片(长300μm,宽150μm,高6.3μm)被集成并结合在沉积在Si衬底上的SiO2中蚀刻的凹槽中,并同轴耦合至在其上制造的介电波导相同的晶圆。组装在6.5μm深的凹槽中的激光器与薄膜Al / In粘结层牢固地焊接在适当的位置,这也使激光薄片的背面与晶片的正面n接触,从而进行测量。仔细优化了Al / In粘结层的成分和厚度,以提供高度可重复的垂直对齐,以最大程度地将激光输出束耦合到介质波导。在220°C的压力辅助温度循环中,激光通过此焊料接合层接合到凹槽中。键合相的低温性质使该集成技术与CMOS兼容。集成激光器在T = 15°C时的脉冲和连续波驱动器分别具有Ith = 17mA和Ith = 19mA阈值电流的激射操作。输出光谱显示出接近1550μm的单模激光,以及25dB的旁模抑制比,该比明显高于典型的Fabry Perot腔激光二极管。此外,集成激光器的特征温度T0为76K,而非集成激光器的特征温度T0为60K。此外,与非集成激光器相比,集成激光器始终显示出较低的阈值电流。激光器和介质波导之间的耦合损耗可提取到低至1dB,该值可通过改善水平对准并更好地匹配激光条和介质波导的宽度来进一步降低。总体而言,这种凹口集成方法与CMOS兼容,高度模块化,紧凑且灵活,允许在集成之前测试和选择器件,并允许将在不同波长下发射的激光集成在同一芯片上。它消除了将III / V衬底晶圆键合到主体Si IC的需要,并且增加了复杂性和成本,并且可以使用易于访问的技术来实现。

著录项

  • 作者

    Famenini Shaya;

  • 作者单位
  • 年度 2012
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  • 原文格式 PDF
  • 正文语种 eng
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