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Temporal and spectral analysis of laser induced plasma in the ablation process of flexible printed circuit board

机译:激光诱导等离子体在柔性印刷电路板的消融过程中的时间和光谱分析

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Flexible printed circuit board (FPCB), consisting of copper sheets laminated onto non conductive film substrates with multiple structures, are core elements in electronics with their flexibility and capability of high density 3 dimensional wiring characteristics. In laser applied FPCB processing, a better understanding of the ablation mechanism leads to precision control of the depth processing especially by monitoring of the material transition layer. For this purpose, here we investigate the temporal and spectral behavior of the plasma plum generated on the single sided structure of FPCB using the technique of laser induced breakdown spectroscopy (LIBS). Using KrF excimer laser, the characteristic spectral emission lines of C_2 swan band at the wavelength of 516.5 nm and neutral copper at the wavelength range from 510 nm to 522 nm are acquired under ambient pressure in the ablation process of polyimide film and copper coated layer respectively. From a time delay from 50 ns to 4.05 μs from the beginning of the laser pulse, the temporal profiles of the spectral intensity are obtained in steps of 200 ns, which have a tendency of exponential decrease on both C_2 and neutral copper. In particular, we concentrate our attention on the temporal intensity behavior of the Bremsstrahlung continuum emission that decides the proper set of detection time window, by which the monitoring sensitivity of LIBS is determined. Finally, using the information of the temporal analysis for each molecular, atomic, and continuum emission, the transition layer between polyimide and copper film is distinguished by their characteristic peak information.
机译:柔性印刷电路板(FPCB),包括层压到具有多个结构的非导电膜的基材的铜薄片,在电子核心要素与它们的高密度三维布线特性的灵活性和能力。在激光施加FPCB加工,更好地理解消融机构引线的所述深度尤其通过监控材料过渡层的处理的精度控制。为了这个目的,在这里我们探讨利用激光诱导击穿光谱(LIBS)的技术FPCB的单面结构产生的等离子体李子的时间和频谱特性。使用KrF准分子激光,C_2天鹅带的在516.5纳米波长和中性铜在波长范围为510纳米至522纳米的特征光谱发射线在环境压力下在聚酰亚胺膜和铜包层的烧蚀过程分别获取。从50 ns至从激光脉冲的开头4.05微秒的时间延迟,在200纳秒步骤,其具有在两个C_2和中性铜指数下降的倾向,得到的光谱强度的时间分布。特别是,我们把注意力集中在其确定正确的设定检测时间窗的,通过该LIBS的监测灵敏度确定轫致辐射连续辐射的时间上的强度特性。最后,使用每个分子,原子,与连续发射时间分析的信息,聚酰亚胺和铜薄膜之间的过渡层是由它们的特征峰的信息区分开来。

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