Challenges of Manufacturing of ITO Ceramics for Sputtering Targets

摘要

Indium-tin oxide (ITO) ceramic sputtering targets are widely used in formation of electrically conductive transparent thin films, which are applicable in different optical electronic devices. These ceramics should be of a high purity with a uniform microcrystalline structure, should possess high density and high electrical conductivity and should provide a formation of required films without structural defects. The challenges of the ceramic composition and manufacturing are considered; they include the use of high quality starting materials, especially In_2O_3 powders with respect to purity, morphology and sinterability, manufacturing routes, sintering process. Umicore Indium Products (UIP) has a positive experience in the development and manufacturing of ITO ceramic planar sputtering targets using in-house prepared In_2O_3 powders; the values of the areas and densities of the ITO ceramic tiles are achieved 1200-1700 cm~2 and 99+ percent of TD, respectively, that is quite challenging for commercial ceramic manufacturing.