首页> 外文会议>Conference on MEMS/MOEMS Components and Their Applications >A novel elevating structure design applied on the motion behavior analysis of micro optical devices by CMOS-MEMS process
【24h】

A novel elevating structure design applied on the motion behavior analysis of micro optical devices by CMOS-MEMS process

机译:CMOS-MEMS过程对微光学器件的运动行为分析应用了一种新型升高结构设计

获取原文

摘要

The paper proposed a novel curb structure to elevate the micro optical devices by the driving force of micro array thermal actuator, MATA. The effects of spring structure and curb structure on the maximum displacements and the variation of surface flatness of the elevated micro mirror varied with operation voltage are investigated. The motion behaviors of the elevated micro mirror are stimulated and analyzed to get the maximum displacement and inclined angle of the device. The results demonstrate the wider width, longer pitch and more pitch numbers of spring structure are; the maximum displacement of the elevated micro mirror is larger. Compared the effects of spring structure and curb structure on the maximum displacement of the elevated micro mirror, there are more influence on the variation of maximum displacement due to the varied spring structure than the varied curb structure. On the other hand, the variation of surface flatness of the elevated micro mirror is more significant by the varied pitch number of spring structure and the varied width of curb structure. The maximum displacement and inclined angle of proposed micro optical device are 58.6μm and 17.04°C, respectively.
机译:本文提出了一种新型凝固结构,以通过微阵列热致动器,Mata提升微光学器件。研究了弹簧结构和遏制结构对具有操作电压的高温镜的最大位移和表面平坦度的变化的影响。刺激和分析升高的微镜的运动行为以获得装置的最大位移和倾斜角度。结果证明了更宽的宽度,更长的俯仰和更多的弹簧结构数量;升高的微镜的最大位移更大。比较弹簧结构和遏制结构对升高的微镜的最大位移的影响,对由于变化的弹簧结构的最大位移的变化产生的影响比不同的凝视结构更大。另一方面,通过各种间距的弹簧结构和曲面结构的变化宽度的变距数更大,升高的微镜的表面平坦度的变化更为显着。所提出的微光学装置的最大位移和倾斜角度分别为58.6μm和17.04℃。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号