首页> 外文会议>International Conference on Silicon Carbide and Related Materials >Modified Hot-Zone Design of Growth Cell for Reducing the Warpage of 6'-SiC Wafer
【24h】

Modified Hot-Zone Design of Growth Cell for Reducing the Warpage of 6'-SiC Wafer

机译:用于减少6“-SIC晶圆的翘曲的生长细胞改性热区设计

获取原文

摘要

The modified hot-zone design, consisting of a new design and new materials for the backside of SiC seed holder was adopted for reducing stress in grown SiC crystal ingot and for reducing the warpage of 6-inch SiC wafer. Crucible lid on the backside of SiC seed holder was designed to be movable during the growth process. Based on the warp value and mapping measurement of FWHM (Full width at half maximum) value in X-ray rocking curve, the crystal quality of SiC crystals grown with new hot-zone design was observed to be better than conventional design.
机译:改进的热区设计,包括用于SiC种子夹的背面的新设计和新材料,用于减少生长的SiC晶锭的应力,并降低6英寸SiC晶片的翘曲。 SiC种子夹背面的坩埚盖设计在生长过程中是可移动的。 基于X射线摇摆曲线的FWHM(半最大宽度)值的翘曲值和映射测量,观察到新的热区设计生长的SiC晶体的晶体质量比传统设计更好。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号