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Minimization of Through Thickness Flaws in Tungsten-doped Diamond Like Carbon Thin Film

机译:通过碳薄膜钨掺杂金刚石中的厚度缺陷最小化

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Tungsten-doped diamond-like carbon (DLC) coatings have been magnetron sputtered onto 52100 steel with chromium and chromium/tungsten carbide dual interlayers. The surface finish (Ra) of the substrate before deposition was 0.102 to 0.203 μm for a set of blocks and 0.05 to 0.10 μm for another set of samples, called buttons. SEM and TEM analyses revealed that this substrate finish as well as surface contaminants resulted in the formation of significant size flaws that develop during the deposition process through the film thickness. On the other hand a perfect flawless film was seen with the smooth substrate in the coupons. It was also observed that the film amplifies the substrate roughness. These two findings impact the tribological performance of the film. Current efforts attempted to determine an optimum set of deposition parameters, such as temperature and buffering gas pressure that would minimize or eliminate the formation of such flaws, and consequently minimize the roughness of the film surface.
机译:掺杂的金刚石样碳(DLC)涂层已经磁控溅射到52100钢中,铬和铬/碳化钨双层夹层。对于一组块,沉积前的基板的表面光洁度(Ra)为0.102至0.203μm,另一组样品为0.05至0.10μm,称为纽扣。 SEM和TEM分析显示,该基材表面以及表面污染物导致形成显着尺寸的缺陷,该缺陷通过膜厚度在沉积过程中产生。另一方面,使用优惠券中的光滑基板看到完美的无瑕疵薄膜。还观察到膜放大衬底粗糙度。这两种结果会影响薄膜的摩擦学性能。目前的努力试图确定最佳的沉积参数,例如温度和缓冲气体压力,其将最小化或消除这种缺陷的形成,并因此最小化膜表面的粗糙度。

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