MACRO MOTIONS WITH MACRO FLEXURES WITH EMPHASIS ON VACUUM COMPATIBILITY

摘要

An admittedly small sub-set of motion systems require Z motions that are perfectly uniform. These are typically applications in semiconductor wafer metrology, primarily as part of systems that involve optical inspection with active auto-focus, ellipsometry, scatterometry or atomic force microscopy. On the "contact allowed" end of the spectrum lies test probing, die attach and other micro-assembly tasks. A smaller sub-set still are those applications of e-beam metrology and the like. Usually these applications will involve a coarse motion of 10-15mm for load/unload of wafers, and a short travel, fine motion at high bandwidth for auto-focus of optical elements.