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A STUDY OF PLANAR MICROVOIDING IN Pb-FREE SOLDER JOINTS

机译:无铅焊点中的平面微量微水

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Planar microvoids have been observed on second level interconnections between solder metallizations and copper lands on PCB boards with immersion silver surface finish. These planar microvoids differ in size and density from the more common process voids that are found in solder joints. However, unlike the process voids, these planar microvoids reduce the reliability margin by accelerating crack propagation during thermal cycling. Therefore, desired target limits on the density of microvoids of different sizes are established. Monitoring of microvoids observed during PCB assembly production correlates the occurrence of microvoids to "caves" found in the copper land underneath the immersion silver coating on the bare PCBs of the same production lots. A mechanism is proposed to explain how the caves lead to microvoids during the reflow process. While a thick silver coating and a rough copper substrate were attributed as probable causes for microvoids in a previous study, a DOE is conducted in this study using a commercial immersion silver process, to evaluate these two factors together with silver bath chemistry and PCB substrate. There are no caves found in any of the conditions in the DOE, even for an extremely thick silver coating (more than 3 microns). Although the thick silver tends to have a slightly higher microvoid density, it is still well below the desired target limits, indicating the occurrence of microvoids is also chemistry dependent.
机译:在PCB板上的焊接金属化和铜陆地之间的第二级互连上观察到平面微孔,其具有浸入银表面光洁度的PCB板之间。这些平面微宽度的尺寸和密度不同于焊点中的更常见的过程空隙。然而,与过程空隙不同,这些平面微宽度通过在热循环期间加速裂纹传播来降低可靠性边距。因此,建立了所需的不同尺寸密度的所需目标限制。在PCB组装生产期间观察到的微脂脂的监测将微脂脂的发生与在浸入相同生产批次的裸机涂层上的浸渍银涂层下面的铜陆中发现的“洞穴”。提出了一种机制来解释洞穴在回流过程中如何导致微管。虽然厚银涂层和粗糙的铜基材被归因于先前研究中的微量微管的可能原因,但在该研究中使用商业浸入银工艺进行DOE,以评估这两个因素与银浴化学和PCB基板一起。母鹿中的任何一个条件下都没有发现洞穴,即使对于极厚的银涂层(超过3微米)。虽然厚银趋于具有稍高的微宽度密度,但它仍然远远低于所需的目标限制,表明细胞的发生也取决于化学。

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