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Reproducibility of Silicon Single Electron Quantum Dot Transistor

机译:硅单电子量子点晶体管的再现性

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In principle, based on the form of tunnel junction, single electron transistor (SET) can be classified into four types, i.e. nanowire SET, quantum dot SET, nanotube SET and point contact SET. Another classification is SET based on the kind of conducting material between gate and island, which consists of resistive-SET and capacitive SET. There are about 18 types of SET designs have previously published by many researchers. This paper describes each SET design of 18 all in the reproducibly design point of view at most the form of source-drain contact junction, layers structure, and the modification of fabrication technology. The reproducibility of single electron transistor can be observed from the equity of design, dimension and device characteristics. Indeed, the forms of SET source-drain contact junction have very large influences on the difficulties level of fabrication processes and electrical characteristics.
机译:原则上,基于隧道结的形式,单电子晶体管(设定)可以分为四种类型,即纳米线组,量子点,纳米管组和点接触组。基于门和岛之间的导电材料的种类来设置另一个分类,其包括电阻设定和电容集。许多研究人员之前有大约18种类型的设定设计。本文介绍了18的每个设置设计,在可重复的设计视角下,最多的源极 - 漏极接触结,层结构和制造技术的改变。单电子晶体管的再现性可以从设计,尺寸和装置特性的权益观察到。实际上,设定源 - 漏极接触结的形式对制造工艺和电气特性的难度水平非常大。

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