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Critical process issues in the fabrication of a Lateral, Self-cleaning, MEMS Switch

机译:侧向,自清洁,MEMS开关的制造中的关键过程问题

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A lateral contact MEMS switch was developed to address the needs for long life cycle, low contact resistance and low cost switches. The device is unique in its self-cleaning of particles, self-alignment of contact surfaces and the mechanical anchoring of the contact metal into the switch structures. The major issue for the lateral contact device fabrication is the creation of the vertical Au sidewall. Existing physical and chemical vapor deposition methods are found not satisfactory. The final Au sidewalls for electric contact are formed by electroplating in pre-patterned photoresist mold. SEM pictures show that the designed undulated contact surfaces are created successfully, and the surface of the electroplated Au is much smoother and denser than that by e-beam evaporation. The long lifecycle test shows that the contact resistance has been maintained below 0.1 fi over 1010 cycles. The test results of the fabricated switch have proved the self-cleaning concept and opened the possibility of direct contact MEMS switch for high power and low cost RF applications.
机译:开发了横向触点MEMS开关,以解决长寿命周期,低接触电阻和低成本开关的需求。该装置在其自清洁颗粒的自清洁,接触表面的自对准以及接触金属的机械锚固到开关结构中的独特。横向接触装置制造的主要问题是垂直Au侧壁的产生。发现现有的物理和化学气相沉积方法不令人满意。用于电接触的最终Au侧壁通过在预图案化的光致抗蚀剂模具中电镀而形成。 SEM图片表明,设计的起伏接触表面成功地创建,电镀AU的表面更光滑,更密集,而不是通过电子束蒸发。长的生命周期测试表明,接触电阻已在1010次以下的0.1°以下。制造开关的测试结果证明了自清洁概念,并打开了直接接触MEMS开关的可能性,用于高功率和低成本RF应用。

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