Micromachining of organic polymers by direct photo-etching using a compact laser plasma soft X-ray source

摘要

The results of experiments on micromachining of organic polymers by direct photo-etching using a compact laser plasma soft X-ray source based on a gas puff target are presented. Soft X-ray radiation in the wavelength range from 2 to 15 nm was produced as a result of irradiation of a double-stream gas puff target with 0.8 J/3 ns laser pulses from a Nd:YAG laser. The soft X-ray pulses with energy of about 100-200 mJ in a single pulse were used to irradiate samples from organic polymers to form microstructures. The obtained results show that direct photo-etching using the laser plasma soft X-ray source could be useful for micromachining of organic polymers. Strong enhancement of the photo-etching process was observed for the samples heated up to 140°C.