首页> 外国专利> Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

机译:激光等离子极紫外和软X射线源的集束目标

摘要

Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup. 2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10- 30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.
机译:公开了用于从超低碎片等离子体源产生极紫外光(EUV)和软X射线辐射的方法和设备。通过各种气体通过温度受控喷嘴的自由射流膨胀以形成分子簇而产生靶标。随后用中等强度(10×11 -10×12瓦/厘米2)的市售激光器辐照这些目标簇,以产生辐射在0.5至100纳米范围内的等离子体。通过适当调整实验条件,可以将激光焦点移至距喷嘴10-30 mm的位置,从而消除由于喷嘴的等离子体腐蚀而产生的碎屑。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号