LOW-TEMPERATURE SYNTHESIS OF SUPERHARD TI-SI-NNANOCOMPOSITE FILMS

摘要

Inductively coupled plasmas (ICPs) were sustained by an internal antenna with insulating coverage to assist conventional magnetron sputtering process. This enabled to irradiate the growing films on the grounded Si (100) substrates with high-density low-energy ion flux. The surface mobility of adatoms could be enhanced markedly but without producing significant forward ion recoils or implantation, and then low-stressed, superhard nanocomposite Ti-Si-N could be synthesized at low deposition temperature by the ICP assisted magnetron sputtering.