Numerical Investigation of Phase-Change Heat Transfer for Laser-Assisted Direct Nano Imprint Processing

摘要

The melting duration and molten depth are key information for Laser-Assisted Direct Imprinting, which raises the issue of the melting & solidification induced by excimer-pulse-laser shining through unilaterally transparent binary materials. Based on the matured laser-annealing analysis, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. The result in this study indicates the laser-annealing case as well as the perfect-contact case provide the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing of thermal-contact resistance during process.