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High frequency low noise potentialities of down to 65 nm technology nodes MOSFETs

机译:低频低噪声潜力降至65 nm技术节点MOSFET

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65 nm n-MOSFETs show state-of-the-art cut-off frequency with f/sub t/ =210 GHz and microwave low noise and high gain properties (NF/sub min/ = 0.8 dB and G/sub ass/=17.3 dB at 12 GHz). As compared with the previous nodes, the high frequency properties of these MOSFETs continue to be in agreement with the downscaling trends.
机译:65 NM N-MOSFET显示最先进的截止频率,具有F / SUM T / = 210 GHz和微波低噪声和高增益属性(NF / SUM MIN / 0.8 dB和G / SUB AS / = 17.3 DB为12 GHz)。与以前的节点相比,这些MOSFET的高频特性继续与较低的趋势达成一致。

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