The effect of the deposition parameters on the structure and properties of CrAlN films prepared by pulsed DC reactive sputtering

摘要

It is well known that the structure and properties of the coatings strongly depend on the deposition method and parameters. The aim of this study was to determine the dependence of structure and properties of CrAlN films on the parameters of pulsed-DC reactive sputtering in a facing targets sputtering system. CrAlN films were prepared in a pulsed-DC magnetron sputtering apparatus in FTS mode with alloy targets (Cr/Al=30at percent/70at percent) with the mixed atmosphere of Ar and N_2. The pulsing power has been changed between 1.5-2kW at the frequency of 120kHz. The XRD analyses were carried out to determine the phase component of the coating. The surface morphology was observed using FE-SEM. Transmission electron microscopy studies were carried out for selected samples. The mechanical properties of the films were evaluated using a nanoindentation test. The content of the Cr,Al,N,O of the films were determined with EPMA.