Amorphous Carbon Film as a Mold Release Layer for Nanoimprint Lithography

摘要

Nanoimprint lithography is expected to be an alternative technology of photolithography. However, durability and anti-sticking property of the molds against imprinted films are critical problem. In this study, hydrogenated amorphous carbon (a-C:H) film was applied to develop harder, smoother and more hydrophobic Si mold, and thermal nanoimprint was conducted. Imprinting pressure and temperature were 4-5 MPa and 150°C respectively. As a result, the wavy lines, caused by destruction through the releasing process, are observed when using a mold without the a-C:H film. On the other hand, in case of mold with a-C:H film, the pattern is neatly transferred.