首页> 外文会议>Society of Photo-Optical Instrumentation Engineers Conference on Recent Developments in Traceable Dimensional Measurements >Development of a two-dimensional nano-displacement measuring system utilizing a combined optical and x-ray interferometer
【24h】

Development of a two-dimensional nano-displacement measuring system utilizing a combined optical and x-ray interferometer

机译:利用组合光学和X射线干涉仪的二维纳米位移测量系统的开发

获取原文

摘要

We have developed a two-dimensional nano-displacement measuring system utilizing a combined optical and x-ray interferometer (COXI). The system consists of optical interferometers for two-dimensional displacements and an x-ray interferometer. The x-ray interferometer was used to calibrate the non-linearity of the optical interferometers. The x-ray interferometer can subdivide the optical interference signal with 0.2 nm linear scales. The measured non-linearity of the heterodyne optical interferometer was less than 2 nm. The calibrated optical interferometers were used to measure two dimensional nanoscale displacements, and the accuracy of the optical interferometers was reduced to sub-nanometer after the compensation. To demonstrate the application of the system, we have measured the non-linearity of capacitive sensors using the calibrated optical interferometers.
机译:我们开发了一种利用组合光学和X射线干涉仪(COXI)的二维纳米位移测量系统。该系统由用于二维位移和X射线干涉仪的光学干涉仪组成。 X射线干涉仪用于校准光学干涉仪的非线性。 X射线干涉仪可以用0.2nm线性尺度细分光学干扰信号。外差光学干涉仪的测量的非线性小于2nm。校准的光学干涉仪用于测量二维纳米级位移,并且在补偿之后将光学干涉仪的精度降低到子纳米。为了证明系统的应用,我们使用校准的光学干涉仪测量了电容传感器的非线性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号