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Processing, Properties and Possible Applications of PZT-Based Thin Films

机译:基于PZT的薄膜的处理,性能和可能的应用

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The radio frequency (RF) sputtering method was utilized to grow PZT-based ferroelectric thin films with the chemical composition Pb(Zr_(0.53)Ti_(0.45)W_(0.01)Cd_(0.01)O_3). The thin films were characterized in terms of their microstructure, crystalline structure, chemical composition and dielectric properties. The processing conditions diagram was defined, which ensured conservation of stoichiometry of the chemical composition of the thin films. Complex impedance spectroscopy was used to measure frequency-dependent dielectric properties of the PZT-type thin films. Great application potential of the PZT-based thin films was considered and possibility to employ as-obtained PZT thin films as active elements of the piezoelectric sensors was reported.
机译:利用射频(RF)溅射方法与化学成分Pb(Zr_(0.53)Ti_(0.01)CD_(0.01)O_3)生长基于PZT的铁电薄膜。薄膜的特征在于它们的微观结构,结晶结构,化学成分和介电性能。定义了处理条件图,该图确保了薄膜的化学成分的化学计量的保护。复杂阻抗光谱用于测量PZT型薄膜的频率依赖性介电性能。考虑了基于PZT的薄膜的巨大应用势,并且报道了作为压电传感器的活性元件作为获得的PZT薄膜的可能性。

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