MOLECULAR VAPOR DEPOSITION~(TM) - A NEW TECHNIQUE FOR SURFACE MODIFICATION

摘要

The improved capability and functionality of a new surface modification technique known as Molecular Vapor Deposition (MVD)? is herein reported. MVD can be briefly described as an enhancement of a vapor deposition method, in which an integrated surface cleaning process and an advance multi-precursor vapor delivery system are made available. With metered exposures of precursor and catalytic vapors, superior surface coatings can be obtained when compared with a liquid-phase deposition technique. The MVD approach also has the capability to create coatings using sequential or "layered" deposition sequences which result in improved film durability, surface coverage, and the ability to coat a wide variety of substrates including glass, plastics, polymers, metals and semiconductors at room temperature.