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Analysis of AFM tip induced oxidation of thin metal film in the air

机译:AFM尖端诱导空气中薄金属膜氧化的分析

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摘要

With the development and application of nanofabrication on nano photoelectron device, the completely oxidized thin metal film such as titanium film by Atomic Force microscope (AFM) tip induced oxidation method has been used to make various nano electric devices. It is more and more important to study the process mechanism for improving the operational stability and reliability of such nano devices. In this paper, the mechanism of AFM tip induced oxidation is analyzed with several aspects. According to the experimental results of AFM tip induced oxidation of titanium under various voltage biases and scanning speeds, we find that the height of the titanium oxidation is linear with the voltage bias and with the negative log of the scanning speed. Based on the formers' theories, the mechanism and the theoretical modeling of AFM tip induced oxidation are improved. By setting the proper conditions such as voltage bias of 8V and scanning speed of 0.1 μm/s, good nanofabrication results with AFM oxidation of titanium are got and the oxide lines are with good aspect ratio and good continuity.
机译:随着纳米光电子装置纳米制造的发展和应用,通过原子力显微镜(AFM)尖端诱导氧化方法的完全氧化薄金属膜如原子力显微镜(AFM)尖膜诱导的氧化法制作各种纳米电气装置。研究用于提高这种纳米器件的操作稳定性和可靠性的过程机制越来越重要。本文用若干方面分析了AFM尖端诱导氧化的机理。根据AFM尖端诱导钛的实验结果在各种电压偏差和扫描速度下氧化钛,我们发现钛氧化的高度与电压偏压和扫描速度的负日志是线性的。基于Formers的理论,改进了AFM尖端诱导氧化的机制和理论建模。通过设定适当的条件,例如8V的电压偏压和0.1μm/ s的扫描速度,得到了钛氧化的良好纳米制作结果,氧化物线具有良好的纵横比和良好的连续性。

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