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Structure Changes Caused by the Stress Gradient In Subsurface Layers of Germanium Single Crystals

机译:由锗单晶的地下层中应力梯度引起的结构变化

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Structural defects in Ge single crystals at low temperature caused by the stress gradient were investigated by optical and electron microscopy. At T = 600 K the cyclic deformation by uniaxial pressing causes sliding of the dislocations along directions <110> in planes {111}, which begins in the subsurface layers at the edges of the samples. At lower temperatures the intensive generation and migration of point defects from concentrators promotes dislocation movement by creeping. The thickness of the subsurface layer with dislocations after repeated loading at 300 K is 5-7 μm and the depth of the deformation clusters reached 50 μm. These results are confirmed by optical microscopy and electrical measurements.
机译:通过光学和电子显微镜研究了由应力梯度引起的低温下Ge单晶的结构缺陷。在T = 600k时,单轴压制的循环变形导致沿着平面{111}中的方向<110>的脱位滑动,这在样品边缘处的地下层开始。在较低的温度下,集中器点缺陷的密集生成和迁移通过爬行来促进脱位运动。在300 k下重复加载后的脱位厚度为5-7μm,并且变形簇的深度达到50μm。这些结果通过光学显微镜和电测量来确认。

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