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Achromatic Four Quadrant Phase Mask using the Dispersion of Form Birefringence

机译:使用形式双折射的分散的消色差四象限相掩模

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摘要

We describe an alternative design for the 4-quadrant phase mask coronagraph described recently by Rouan et al. 2000. Based on the same principle, i.e. producing a very efficient nulling by mutually destructive interferences of the coherent light from the main source, our mask realises the π phase shift using some properties of ZOGs (Zeroth Order Gratings) and according to an original scheme respecting the 4-quadrant symmetry. When the period of the one-dimension grating structure is smaller than the wavelength of the incident light, the structure becomes birefringent. The effective refractive indices depend on the wavelength. Using this feature, we can design a mask whose nulling efficiency is maintained within a wide wavelength range. Numerical simulations were made according to the RCWT (Rigorous Coupled Wave Theory).
机译:我们描述了Rouan等人最近描述的4-象限相掩模调节件的替代设计。基于相同的原理,即通过来自主要来源的相干光的相互破坏性干扰产生非常有效的效力,我们的掩模通过Zogs(Zeroth订单光栅)的一些性质实现了π相移,并根据原始方案尊重4象限对称性。当一维光栅结构的时段小于入射光的波长时,该结构变为双折射。有效的折射率取决于波长。使用此功能,我们可以设计一个掩模,其无效效率保持在宽波长范围内。根据RCWT(严谨耦合波理论)进行数值模拟。

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