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Does Technology Acceleration Equate to Mask Cost Acceleration?

机译:技术加速度是否等同于掩码成本加速?

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The technology acceleration of the ITRS Roadmap has many implications on both the semiconductor supplier community and the manufacturers. INTERNATIONAL SEMATECH has revaluated the projected cost of advanced technology masks. Building on the methodology developed in 1996 for mask costs, this work provided a critical review of mask yields and factors relating to the manufacture of photolithography masks. The impact of the yields provided insight into the learning curve for leading edge mask manufacturing. The projected mask set cost was surprising, and the ability to provide first and second year cost estimates provided additional information on technology introduction. From this information, the impact of technology acceleration can be added to the projected yields to evaluate the impact on mask costs.
机译:ITRS路线图的技术加速在半导体供应商社区和制造商上具有许多影响。国际SEMATECH已重新评估先进技术面具的预计成本。在1996年开发的方法中建立掩码成本,这项工作提供了对掩模产量的关键评论和与制造光刻面具的制造有关的因素。收益率的影响为前缘掩模制造的学习曲线提供了深度。预计面具设定成本令人惊讶,提供第一年和第二年成本估算的能力提供了有关技术介绍的额外信息。根据这些信息,可以将技术加速的影响添加到预计的产量中,以评估对掩码成本的影响。

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