EPITAXIAL GROWTH OF Eu{sub}3NbO{sub}7 BUFFER LAYERS ON BIAXIALLY TEXTURED Ni-W SUBSTRATES

摘要

Epitaxial film of Eu{sub}3NbO{sub}7 was deposited on biaxially textured nickel-3 at.% tungsten (Ni-W) substrates by using sol-gel processing. Precursor solution of 0.50 M concentration of total cation was spin coated on short samples of Ni-W substrates and films were crystallized at 1050°C in a gas mixture of Ar-4%H{sub}2 for 15 minutes. High temperature in situ x-ray diffraction (HTXRD) studies show that the nucleation of Eu{sub}3NbO{sub}7 films starts at 800°C. θ/26 x-ray diffractograms revealed only (004) reflections, indicating a high degree of out-of-plane texture. Detailed X-Ray studies indicate that Eu{sub}3NbO{sub}7 films has good out-of-plane and in-plane textures with full-width-half-maximum values of 6.8° and 8.21°, respectively. Scanning electron microscopy showed that the films were smooth, continuous, and free of pin holes. Efforts are under way to grow YBCO films on sol-gel derived Eu{sub}3NbO{sub}7 buffer layers.