AIRBORNE MOLECULAR CONTAMINATION (AMC) A NEW GLASS FILTER MEDIA SOLUTION

摘要

The current number-one concern in semi-conductor and disk drive cleanrooms is airborne molecular contamination. Airborne molecular contaminants include acids, bases, condensables, and dopants. They cause yield reductions in many semi-conductor process steps such as pre-gate oxidation, salicidation, contact formation, and DUV lithography. As line dimensions become smaller the impact of molecular contaminants has a high priority. This paper will review the industry conventional wisdom on airborne molecular contaminants and discuss a new microfiberglass filtration media that has been developed to meet the new industry demands.