首页> 外文会议>IEEE Lester Eastman Conference on High Performance Devices >Channel recessed 4H-SiC MESFETs with F{sub}t of 14.5GHz and F{sub}(max) of 40GHz
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Channel recessed 4H-SiC MESFETs with F{sub}t of 14.5GHz and F{sub}(max) of 40GHz

机译:通道嵌入了4H-SIC MESFET,具有40GHz的14.5GHz和f {sub}(max)的f {sub} t

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Channel recessed 4H-SiC MESFETs have demonstrated excellent small signal characteristics and the effect of Si{sub}3N{sub}4 passivation on these devices has been studied in this work. A saturated current of 250-270 mA/mm and a maximum transconductance of 40-45 mS/mm were measured for these devices. The 3-terminal breakdown voltage V{sub}(ds) ranges from 120 V to more than 150 V, depending on gate-drain spacing. 2 × 200 μm devices with 0.45 μm gate length show high F{sub}t of 14.5 GHz and F{sub}(max) of 40 GHz. After Si{sub}3N{sub}4 passivation, the output power and PAE were increased by 40% and 16%, respectively, for CW power measurement. Other measurements, such as, the change in surface potential and the dispersion of the drain current make it clear that the passivation of SiC MESFETs reduces the surface effects and enhances the RF power performance by suppressing the instability in DC characteristics.
机译:频道嵌入的4H-SIC MESFET已经证明了优异的小信号特性,并且在这项工作中已经研究了SI {sub} 3n {sub} 4对这些设备的钝化。测量这些装置的250-270mA / mm的饱和电流和40-45ms / mm的最大跨导。根据栅极 - 漏极间距,3端子击穿电压V {Sub}(DS)范围为120 V至大于150 V。具有0.45μm长度的2×200μm器件,显示为40 GHz的14.5 GHz和f {sub}(max)的高f {sub} t。在SI {SUB} 3N {SUB} 4钝化之后,对于CW功率测量,输出功率和PAE分别增加了40%和16%。其他测量,例如,表面电位的变化和漏极电流的分散使得SiC Mesfet的钝化通过抑制DC特性中的不稳定性来降低表面效应并增强RF功率性能。

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