首页> 外文会议>日本応用磁気学会学術講演会 >Study of Post Deposition Annealing for C-axis Orientation of BaM Thin Film Deposited on Amorphous Aluminum Oxide (a-AlO)
【24h】

Study of Post Deposition Annealing for C-axis Orientation of BaM Thin Film Deposited on Amorphous Aluminum Oxide (a-AlO)

机译:在非晶氧化铝(A-ALO)上沉积BAM薄膜C轴取向后沉积退火的研究

获取原文

摘要

Barium ferrite (BaM) thin films possessing high anisotropy field, good mechanical strength and chemical stability arc attractive candidate for the high density perpendicular recording material. But c-axis orientation, which is prime concern for the perpendicular recording, requires substrate temperature in a range of 500-600 deg C. This substrate temperature is strongly recommended to decrease . Post deposition annealing is one of the alternatives to reduce the necessity of in sin, substrate heating. In this study as-deposited amorphous BaM thin films were annealed at different temperature and time. This study was also involved to find out the different annealing factors.
机译:钡铁氧体(BAM)薄膜具有高各向异性场,机械强度良好,化学稳定性是高密度垂直记录材料的有吸引力的候选者。但是对于垂直记录的主要关注的C轴取向需要在500-600℃的范围内的基板温度。强烈建议将该基板温度变得降低。后沉积退火是减少罪,衬底加热的必要性的替代方案之一。在本研究中,沉积的无定形BAM薄膜在不同的温度和时间内退火。该研究还涉及发现不同的退火因素。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号