首页> 外国专利> FORMATION OF OXIDE SUPERCONDUCTING THIN FILM WITH C-AXIS IN-PLANE ORIENTATION AND A-AXIS ORIENTATION AND BASE BODY THEREFOR

FORMATION OF OXIDE SUPERCONDUCTING THIN FILM WITH C-AXIS IN-PLANE ORIENTATION AND A-AXIS ORIENTATION AND BASE BODY THEREFOR

机译:利用C轴面内定向和A轴定向并以基体为主体的氧化物超导薄膜的形成

摘要

PURPOSE: To obtain an oxide superconducting thin film excellent in crystallinity and surface smoothness by forming a specific buffer layer on an oxide single crystal base body followed by forming thereon an oxide superconducting thin film. ;CONSTITUTION: This superconducting thin film is obtained by forming a buffer layer consisting of an oxide single crystal thin film with rectangular surface lattice on an oxide single crystal base body followed by forming thereon an oxide superconducting thin film. By this method, the objective oxide superconducting thin film with c-axis in-plane orientation and a-axis orientation excellent in crystallinity and surface smoothness can be formed. Therefore, SIS tunnel junction is also made possible. Use of a multiple oxide having GdFeO3 structure as the buffer layer makes the objective oxide superconducting thin film with more excellent crystallinity and surface smoothness able to be formed because the GdFeO3 structure resembles the crystal structure of the aimed thin film.;COPYRIGHT: (C)1996,JPO
机译:用途:通过在氧化物单晶基体上形成特定的缓冲层,然后在其上形成氧化物超导薄膜,以获得结晶度和表面光滑度优异的氧化物超导薄膜。 ;组成:该超导薄膜是通过在氧化物单晶基体上形成由具有矩形表面晶格的氧化物单晶薄膜组成的缓冲层,然后在其上形成氧化物超导薄膜而获得的。通过这种方法,可以形成具有结晶性和表面平滑性优异的c轴面内取向和a轴取向的目标氧化物超导薄膜。因此,SIS隧道结也成为可能。通过使用具有GdFeO 3 结构的复合氧化物作为缓冲层,由于GdFeO 3 结构可以形成具有更优异的结晶度和表面光滑度的目标氧化物超导薄膜。类似于目标薄膜的晶体结构。;版权所有:(C)1996,日本特许厅

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