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Vertical stacks of InAs quantum dots embedded into short-period AlAs/GaAs superlattice

机译:嵌入式嵌入式堆积堆积成短时期ALAS / GAAS超晶格

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Single layers and vertical stacks of coherent InAs quantum dots (QDs) embedded into GaAs/AlAs short-period superlattice (SPSL) were grown by molecular beam epitaxy at 475 °C. Photoluminescence (PL), atomic force microscopy and transmission electron microscopy were used to analyze the structure and optical properties of QD structures. Well-aligned vertical stacks of QDs were observed for the spacings up to 12 nm, though the electronic coupling was low at large spacings as measured by the shift of the PL band. Reduction of thermal quenching of the QD luminescence band was observed due to increased band gap of the barrier material Multilayer QD stacks showed wider dispersion of sizes and higher rate of nonradiative recombination, but exhibited similar PL efficiency and thermal quenching as the single QD layers. Use of SPSL allowed us to obtain a multiple-plane QD active media with the emission band centered below 1000 nm.
机译:嵌入到GaAs / Alas短周期超晶格(SPSL)的单层和垂直堆叠的连贯的INA量子点(QDS)被475℃的分子束外延生长。光致发光(PL),原子力显微镜和透射电子显微镜用于分析QD结构的结构和光学性质。对于长达12nm的间距,观察到稳定对齐的QD QD,尽管通过PL带的偏移测量,所以电子耦合在大的间距处于大的间距。由于屏障材料的增加的带隙,观察到QD发光带的热淬火的减少,这些屏障材料多层QD堆叠显示尺寸和更高的非接种性重组率更宽,但表现出类似的PL效率和热淬火作为单个QD层。使用SPSL允许我们获得多平面QD活动介质,发射带以低于1000nm为中心。

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