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3-D surface profile measurements of large x-ray synchrotron radiation mirrors using stitching interferometry

机译:使用缝合干涉测量的大型X射线同步辐射镜的3-D表面轮廓测量

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Stitching interferometry, using small-aperture, high-resolution, phase-measuring interferometery, has been proposed for quite some time now as a metrology technique to obtain 3-dimensional profiles of surfaces of oversized optical components and substrates. The aim of this work is to apply this method to the specific case of long grazing-incidence x-ray mirrors, such as those used in beamlines at synchrotron radiation facilities around the world. Both fabrication and characterization of these mirrors would greatly benefit from this technique because it offers the potential for providing measurements with accuracy and resolution better than those obtained using existing noncontact laser profilers, such as the long trace profiler (LTP). Measurement data can be used as feedback for computer-controlled fabrication processes to correct for possible topography errors. The data can also be used for simulating and predicting mirror performance under realistic conditions. A semiautomated stitching system was built and tested at the X-ray Optics Metrology Laboratory of the Advanced Photon Source at Argonne National Laboratory. The initial objective was to achieve a measurement sensitivity on the order of 1 μrad rms. Preliminary tests on a 1m-long x-ray mirror showed system repeatability of less than 0.6 μrad rms. This value is comparable to that of a conventional LTP. The measurement accuracy was mostly affected by environmental perturbations and system calibration effects. With a full automated and improved system (to be built in the near future), we expect to achieve measurement sensitivity on the order of 0.01 μrad rms or better. In this paper, after a brief review of basic principles and general technical difficulties and challenges of the stitching technique, a detailed description of the measurement setup is given and preliminary results obtained with it are analyzed and discussed.
机译:拼接干涉,使用小孔径,高分辨率,相位测量interferometery,已经提出了很长一段时间,现在作为一个计量技术来获得过大的光学元件和衬底的表面的3维轮廓。这个工作的目的是该方法适用于长掠入射X射线反射镜,如在世界各地的同步加速器辐射设施中使用的光束线的特定情况。这些反射镜的两种制备和表征将从这种技术极大地受益,因为它提供了潜在的提供准确,比使用现有的非接触式激光廓线仪,得到的更好的分辨率的测量,如长期跟踪分析器(LTP)。测量数据可以被用作用于计算机控制的制造过程,以校正可能的地形的错误的反馈。该数据还可以用于模拟和预测现实条件下反射镜的性能。半自动拼接系统建成并在X射线的先进光子源的光学计量实验室在阿贡国家实验室进行测试。在最初的目标是,以达到1个微弧度均方根量级的测量灵敏度。上1米长的x射线反射镜初步试验表明小于0.6微弧度有效值系统重复性。此值是可比于常规的LTP。测量精度主要是受环境扰动和系统校准效应的影响。一个完整的自动化和改进的系统(待建在不久的将来),我们期望达到的0.01微弧度有效值或更好的量级测量灵敏度。在本文中,基本原则和总体技术困难和拼接技术的挑战,简要回顾后,测量设置的详细描述,并给出与其获得的初步结果进行了分析和讨论。

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