DEVICE AND METHOD FOR EXPOSURE TO X-RAY, X-RAY MASK, X- RAY MIRROR SYNCHROTRON RADIATION DEVICE, METHOD FOR SYNCHROTRON RADIATION AN SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To make it possible to realize the high-definition transcription of patterns and high throughput by providing an X-ray mirror containing a material that has an absorption edge in only one, at least, of the first wavelength range where a wavelength is shorter than a specific value to X rays and the second wavelength range where a wavelength exceeds a specific value to X rays. SOLUTION: For instance, an X-ray aligner has a synchrotron radiation source 1 and an x-ray mirror 3 made by forming a thin-film diamond layer on a silicon substrate, for example. The X-ray mirror 3 securely reflects because it does not have an absorption peak in the wavelength range between 0.45 nm and 0.7 nm inclusive and the X-ray reflectance of the mirror 3 plunges in the wavelength range that is 0.45 nm or shorter. Consequently, the peak wavelength of X rays used for exposure is adjusted to the high-definition transcription of circuit patterns and high throughput and the degradation of resolution due to photoelectrons is prevented by decreasing the content of X rays whose wavelength is shorter than a peak wavelength. Boron nitride, diamond-like carbon, titanium and the like are also used as a material for the mirror 3.